Ion beam smoothing of fused silica at atomic-scale assisted by damage recovery using inductively coupled plasma-Reference-Cited by-同舟云学术

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Ion beam smoothing of fused silica at atomic-scale assisted by damage recovery using inductively coupled plasma

Published:2024-10 Issue: Volume:90 Page:71-80
ISSN:0141-6359
Container-title:Precision Engineering
language:en
Short-container-title:Precision Engineering

Author:

Wu Bing,Liang Shaoxiang,Zhang Junqi,Ding Xuemiao,Chiu Tom,Huang Pei,Wang Yinhui,Deng Hui^ORCID

Publisher

Elsevier BV

Reference35 articles.

1. Development of dioptric projection lenses for deep ultraviolet lithography at Carl Zeiss;Ulrich;J Nanolithogr MEMS, MOEMS,2004

2. Comparison of EUV photomask metrology between CD-AFM and TEM;Dai;Nanomanufacturing and Metrology,2022

3. Focusing of X-ray free-electron laser pulses with reflective optics;Yumoto;Nat Photonics,2013

4. Lithography gets extreme;Wagner;Nat Photonics,2010

5. Current status in and future trends of ultraprecision machining and ultrafine materials processing;Taniguchi;CIRP annals,1983

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