Comparative study of structural and stoichiometric properties of titanium nitride films deposited by cathodic cage plasma deposition and magnetron sputtering-Reference-Cited by-同舟云学术

Comparative study of structural and stoichiometric properties of titanium nitride films deposited by cathodic cage plasma deposition and magnetron sputtering

Published:2022-03-09 Issue:3 Volume:137 Page:
ISSN:2190-5444
Container-title:The European Physical Journal Plus
language:en
Short-container-title:Eur. Phys. J. Plus

Author:

Nascimento I. O.,Naeem M.^ORCID,Freitas R. S.,Nascimento R. M.,Viana B. C.,Sousa R. R. M.,Feitor M. C.,Iqbal Javed,Costa T. H. C.

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy,Fluid Flow and Transfer Processes

Link

https://link.springer.com/content/pdf/10.1140/epjp/s13360-022-02543-8.pdf

Reference46 articles.

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3. K. Smagoń et al., Studies of the micromorphology of sputtered TiN thin films by autocorrelation techniques. The Eur. Phys. J. Plus 132(12), 1–15 (2017)

4. L.H.P. Abreu et al., Synthesis of TiN and TiO 2 thin films by cathodic cage plasma deposition: a brief review. J. Braz. Soc. Mech. Sci. Eng. 42(9), 1–13 (2020)

5. L. Romero et al., Titanium dioxide thin films deposited by electric field-assisted CVD: effect on antimicrobial and photocatalytic properties. Chem. Vapor Deposit. 21, 63–70 (2015)

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