Subtractive Patterning via Chemical Lift-Off Lithography

Author:

Liao Wei-Ssu12,Cheunkar Sarawut13,Cao Huan H.12,Bednar Heidi R.12,Weiss Paul S.12345,Andrews Anne M.1267

Affiliation:

1. California NanoSystems Institute, University of California, Los Angeles, CA 90095, USA.

2. Department of Chemistry and Biochemistry, University of California, Los Angeles, CA 90095, USA.

3. Department of Chemistry, Pennsylvania State University, University Park, PA 16802, USA.

4. Department of Materials Science and Engineering, University of California, Los Angeles, CA 90095, USA.

5. Department of Physics, Pennsylvania State University, University Park, PA 16802, USA.

6. Department of Psychiatry and Biobehavioral Health, University of California, Los Angeles, CA 90095, USA.

7. Semel Institute for Neuroscience and Human Behavior, University of California, Los Angeles, CA 90095, USA.

Abstract

Patterning by Subtraction Soft lithographic patterning is usually a “positive” inking process. A polymer stamp is cured on a hard master substrate and then inked with molecules such as alkane thiols, which can then be transferred to a second substrate (such as gold). However, the resolution of the transferred pattern is often degraded by surface diffusion. Liao et al. (p. 1517 ; see the Perspective by Rogers ) obtained higher resolution in a subtractive approach, in which oxygen-plasma–activated silicone stamps removed hydroxyl-terminated alkane thiols from gold surfaces. This lift-off process also removed the terminal gold atom bound to the alkane thiol. The bare regions could be backfilled with protein molecules, and multiple lift-off steps could create patterns with features as small as 40 nanometers.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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