Physical Limits in Semiconductor Electronics
Author:
Affiliation:
1. Research staff member at the IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598
Publisher
American Association for the Advancement of Science (AAAS)
Subject
Multidisciplinary
Reference27 articles.
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4. BREWER, G.R., APPLICATION OF ELECTRON/ION BEAM TECHNOLOGY TO MICROELECTRONICS, IEEE SPECTRUM 8: 23 (1971).
5. BROERS, A.N., ELECTRON-BEAM FABRICATION OF 80-A METAL STRUCTURES, APPLIED PHYSICS LETTERS 29: 596 (1976).
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