Particle-phase accretion forms dimer esters in pinene secondary organic aerosol

Author:

Kenseth Christopher M.1ORCID,Hafeman Nicholas J.1ORCID,Rezgui Samir P.1ORCID,Chen Jing2ORCID,Huang Yuanlong3ORCID,Dalleska Nathan F.3ORCID,Kjaergaard Henrik G.2ORCID,Stoltz Brian M.1ORCID,Seinfeld John H.14ORCID,Wennberg Paul O.34ORCID

Affiliation:

1. Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, CA 91125, USA.

2. Department of Chemistry, University of Copenhagen, DK-2100 Copenhagen, Denmark.

3. Division of Geological and Planetary Sciences, California Institute of Technology, Pasadena, CA 91125, USA.

4. Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA 91125, USA.

Abstract

Secondary organic aerosol (SOA) is ubiquitous in the atmosphere and plays a pivotal role in climate, air quality, and health. The production of low-volatility dimeric compounds through accretion reactions is a key aspect of SOA formation. However, despite extensive study, the structures and thus the formation mechanisms of dimers in SOA remain largely uncharacterized. In this work, we elucidate the structures of several major dimer esters in SOA from ozonolysis of α-pinene and β-pinene—substantial global SOA sources—through independent synthesis of authentic standards. We show that these dimer esters are formed in the particle phase and propose a mechanism of nucleophilic addition of alcohols to a cyclic acylperoxyhemiacetal. This chemistry likely represents a general pathway to dimeric compounds in ambient SOA.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3