Scalable submicrometer additive manufacturing

Author:

Saha Sourabh K.1ORCID,Wang Dien2ORCID,Nguyen Vu H.1ORCID,Chang Yina2ORCID,Oakdale James S.1,Chen Shih-Chi2ORCID

Affiliation:

1. Center for Engineered Materials and Manufacturing, Lawrence Livermore National Laboratory, Livermore, CA, USA.

2. Department of Mechanical and Automation Engineering, The Chinese University of Hong Kong, Shatin, Hong Kong.

Abstract

Speeding up submicrometer printing Using light to build three-dimensional structures with photopolymerization is the basis for two-photon lithography. However, there has been a trade-off between speed and resolution for fabricating structures with this method. Saha et al. optimize a new parallel printing methodology that relies on ultrafast lasers. They show the ability to dramatically increase the speed of printing while maintaining submicrometer resolution. Science , this issue p. 105

Funder

Lawrence Livermore National Laboratory, Office of Science

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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