Planar Patterned Magnetic Media Obtained by Ion Irradiation-Reference-Cited by-同舟云学术

Planar Patterned Magnetic Media Obtained by Ion Irradiation

Published:1998-06-19 Issue:5371 Volume:280 Page:1919-1922
ISSN:0036-8075
Container-title:Science
language:en
Short-container-title:Science

Author:

Chappert C.¹²³⁴,Bernas H.¹²³⁴,Ferré J.¹²³⁴,Kottler V.¹²³⁴,Jamet J.-P.¹²³⁴,Chen Y.¹²³⁴,Cambril E.¹²³⁴,Devolder T.¹²³⁴,Rousseaux F.¹²³⁴,Mathet V.¹²³⁴,Launois H.¹²³⁴

Affiliation:

1. C. Chappert, V. Kottler, T. Devolder, V. Mathet, Institut d'Electronique Fondamentale, Unité de Recherche Associée CNRS 022, Université Paris Sud, 91405 Orsay Cedex, France.

2. H. Bernas, Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, Unité Propre de Recherche CNRS 6412, Université Paris Sud, 91405 Orsay Cedex, France.

3. J. Ferré and J.-P. Jamet, Laboratoire de Physique des Solides, Unité de Recherche Associée CNRS 02, Université Paris Sud, 91405 Orsay Cedex, France.

4. V. Kottler, Y. Chen, E. Cambril, F. Rousseaux, H. Launois, Laboratoire de Microstructures et de Microélectronique, Unité Propre de Recherche CNRS 020, 196 Avenue H. Ravera, BP 107, 92225 Bagneux Cedex, France.

Abstract

By ion irradiation through a lithographically made resist mask, the magnetic properties of cobalt-platinum simple sandwiches and multilayers were patterned without affecting their roughness and optical properties. This was demonstrated on arrays of 1-micrometer lines by near- and far-field magnetooptical microscopy. The coercive force and magnetic anisotropy of the irradiated regions can be accurately controlled by the irradiation fluence. If combined with high-resolution lithography, this technique holds promise for ultrahigh-density magnetic recording applications.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

Reference28 articles.

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5. Imprint Lithography with 25-Nanometer Resolution

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