Structure of the Ultrathin Aluminum Oxide Film on NiAl(110)-Reference-Cited by-同舟云学术

Structure of the Ultrathin Aluminum Oxide Film on NiAl(110)

Published:2005-06-03 Issue:5727 Volume:308 Page:1440-1442
ISSN:0036-8075
Container-title:Science
language:en
Short-container-title:Science

Author:

Kresse Georg¹²,Schmid Michael¹²,Napetschnig Evelyn¹²,Shishkin Maxim¹²,Köhler Lukas¹²,Varga Peter¹²

Affiliation:

1. Institut für Materialphysik and Centre for Computational Materials Science, Universität Wien, A-1090 Wien, Austria.

2. Institut für Allgemeine Physik, Technische Universität Wien, A-1040 Wien, Austria.

Abstract

The well-ordered aluminum oxide film formed by oxidation of the NiAl(110) surface is the most intensely studied metal surface oxide, but its structure was previously unknown. We determined the structure by extensive ab initio modeling and scanning tunneling microscopy experiments. Because the topmost aluminum atoms are pyramidally and tetrahedrally coordinated, the surface is different from all Al 2 O 3 bulk phases. The film is a wide-gap insulator, although the overall stoichiometry of the film is not Al 2 O 3 but Al 10 O 13 . We propose that the same building blocks can be found on the surfaces of bulk oxides, such as the reduced corundum (0001) surface.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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