Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers-Reference-Cited by-同舟云学术

Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers

Published:1995-09 Issue:5228 Volume:269 Page:1255-1257
ISSN:0036-8075
Container-title:Science
language:en
Short-container-title:Science

Author:

Berggren Karl K.¹,Bard Andreas²,Wilbur James L.³,Gillaspy John D.²,Helg Andreas G.³,McClelland Jabez J.⁴,Rolston Steven L.²,Phillips William D.²,Prentiss Mara¹,Whitesides George M.³

Affiliation:

1. Department of Physics, Harvard University, Cambridge, MA 02138, USA.

2. Atomic Physics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.

3. Department of Chemistry, Harvard University, Cambridge, MA 02138, USA.

4. Electron Physics Group, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

Reference26 articles.

1. ABBOTT, N.L., MANIPULATION OF THE WETTABILITY OF SURFACES ON THE 0.1-MICROMETER TO 1-MICROMETER SCALE THROUGH MICROMACHINING AND MOLECULAR SELF-ASSEMBLY, SCIENCE 257: 1380 (1992).

2. ADAMS, C.S., ATOM OPTICS, PHYSICS REPORTS-REVIEW SECTION OF PHYSICS LETTERS 240: 143 (1994).

3. BEHRINGER, R.E., J OPT SOC AM B 11: 1166 (1994).

4. BOZCO, F, J CHEM PHYS 78: 4256 (1983).

5. Bain, C. D., Journal of the American Chemical Society 111: 7155 (1989).

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