Depth analysis on oxidation of Al/Si(111) thin film by X-ray photoelectron spectroscopy using synchrotron radiation
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/54/i=5/a=055202/pdf
Reference64 articles.
1. LEED Studies of Oxygen Adsorption on the (100) Face of Aluminum
2. LEED Studies of Oxygen Adsorption on the (111) and (110) Surfaces of Aluminum
3. Low-Energy-Electron Diffraction from Several Surfaces of Aluminum
4. Oxygen adsorption on aluminum single crystal faces studied by AES, XPS and LEED
5. Oxidation of Al(111)
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Reduction of the Casimir force in Al due to oxidation;EPL (Europhysics Letters);2019-05-07
2. Near-Field Radiative Heat Transfer around the Percolation Threshold in Al Oxide Layers;The Journal of Physical Chemistry C;2019-04-09
3. Erratum: “Depth analysis on oxidation of Al/Si(111) thin film by X-ray photoelectron spectroscopy using synchrotron radiation”;Japanese Journal of Applied Physics;2016-09-20
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