Instantaneous Generation of Many Flaked Particles by Impulsive Force of Electric Field Stress Acting on Inner Wall of Mass-Production Plasma Etching Equipment-Reference-Cited by-同舟云学术

Instantaneous Generation of Many Flaked Particles by Impulsive Force of Electric Field Stress Acting on Inner Wall of Mass-Production Plasma Etching Equipment

Published:2013-06-01 Issue:6R Volume:52 Page:066201
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kasashima Yuji,Nabeoka Natsuko,Uesugi Fumihiko

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference28 articles.

1. Reduction of Particle Contamination in Plasma-Etching Equipment by Dehydration of Chamber Wall

2. Modeling of and experiments on dust particle levitation in the sheath of a radio frequency plasma reactor

3. Observation of Heat-Induced Particle Resuspension and Transport in a Plasma Chemical Vapor Deposition Chamber

4. Particle trapping phenomena in radio frequency plasmas

5. Rastered laser light scattering studies during plasma processing: Particle contamination trapping phenomena

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