Capturing H and H2by SiHx+(x≤ 4) ions: Comparison between Langevin and quantum statistical models
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/56/i=2/a=026101/pdf
Reference44 articles.
1. Thin-Film Silicon –Growth Process and Solar Cell Application–
2. Comparison of a-Si TFTs fabricated by Cat-CVD and PECVD methods
3. Gas-Phase Reactions between Silane and Ammonia: A Theoretical Study
4. Quantum Langevin model for exoergic ion-molecule reactions and inelastic processes
5. Development of a parallel semi-implicit two-dimensional plasma fluid modeling code using finite-volume method
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1. Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH2+ and SiH3+ Ions and Related Reverse Ion–Molecule Reactions of Interest to PECVD of α-Si:H Films;Plasma Chemistry and Plasma Processing;2019-07-24
2. Ideal gas thermochemical properties of silicon containing inorganic, organic compounds, radicals, and ions;International Journal of Chemical Kinetics;2018-06-12
3. Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH4 + Ion and Related Reverse Ion–Molecule Reactions of Interest to PECVD of a-Si:H Films;Plasma Chemistry and Plasma Processing;2017-06-03
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