Recent progress for obtaining the ferroelectric phase in hafnium oxide based films: impact of oxygen and zirconium
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://iopscience.iop.org/article/10.7567/1347-4065/ab45e3/pdf
Reference44 articles.
1. Ferroelectricity in hafnium oxide thin films
2. Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors
3. Ferroelectricity in Simple Binary ZrO2 and HfO2
4. Ferroelectricity in Gd-Doped HfO2Thin Films
5. Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material
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