SURFACE ROUGHNESS OF SPUTTERED SILICON. II. MODEL VERIFICATION-Reference-Cited by-同舟云学术

SURFACE ROUGHNESS OF SPUTTERED SILICON. II. MODEL VERIFICATION

Published:2001-06-30 Issue:3 Volume:16 Page:315-329
ISSN:1042-6914
Container-title:Materials and Manufacturing Processes
language:en
Short-container-title:Materials and Manufacturing Processes

Author:

Ali M. Y.,Hung N. P.

Publisher

Informa UK Limited

Subject

Industrial and Manufacturing Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://www.tandfonline.com/doi/pdf/10.1081/AMP-100107377

Reference11 articles.

1. Utlaut, M. 1997.Handbook of Charged Particles OpticsEdited by: Orloff, J. 429–488. New York: CRC Press.

2. Hung, N. P. and Ali, M. Y. 2000. Producing High-Aspect-Ratio Micro Features on Nickel Beryllium. Proceedings of the International Conference on Precision Engineering. 2000, Singapore. pp.517–522.

3. Hung, N. P., Ali, M. Y. and Yuan, S. 2000. Producing LIGA-Competitive Microcomponents. Proceedings of the International Conference on Micromachining and Microfabrication Process Technology VI, SPIE 4174. 2000. pp.49–57.

4. Hung, N. P., Fu, Y. Q. and Ali, M. Y. 2000. Focused Ion Beam Machining of Silicon. Proceedings of the International Conference on Precision Engineering. 2000, Singapore. pp.568–573.

5. Prewett, P. D. and Mair, G. L.R. 1991.Focused Ion Beam from Liquid Metal Ion Sources151–173. New York: John Wiley & Sons.

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