Author:
Shibanov Daniil,Lopaev Dmitry,Maslakov Konstantin I.,Konnikova Maria,Rakhimov Aleksander
Reference57 articles.
1. Recent advances in reactive ion etching and applications of high-aspect-ratio microfabrication;M Huff;Micromachines (Basel),2021
2. Magnetron sputtering: a review of recent developments and applications;P J Kelly;Vacuum,2000
3. Ion Implantation
4. Overview of atomic layer etching in the semiconductor industry;K J Kanarik;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,2015