A survey on the reactive ion etching of silicon in microtechnology-Reference-Cited by-同舟云学术

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A survey on the reactive ion etching of silicon in microtechnology

Published:1996-03-01 Issue:1 Volume:6 Page:14-28
ISSN:0960-1317
Container-title:Journal of Micromechanics and Microengineering
language:
Short-container-title:J. Micromech. Microeng.

Author:

Jansen Henri,Gardeniers Han,Boer Meint de,Elwenspoek Miko,Fluitman Jan

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials

Reference46 articles.

1. The design of plasma etchants

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