TiO2–SiO2 nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O2/HMDSO low-pressure plasma

Abstract

Abstract TiO2 nanoparticles (NPs), 3 nm in size, were injected inside a very-low-pressure O2 plasma reactor using a liquid injector and following an iterative injection sequence. Simultaneously, hexamethyldisiloxane (HMDSO) vapor precursor was added to create a SiO2 matrix and a TiO2–SiO2 nanocomposite (NC) thin film. Both the liquid injection and vapor precursor parameters were established to address the main challenges observed when creating NCs. In contrast to most aerosol-assisted plasma deposition processes, scanning/transmission electron microscopy (S/TEM) indicated isolated (i.e. non-agglomerated) NPs distributed in a rather uniform way in the matrix. The fraction of the TiO2 NPs inside the SiO2 matrix was estimated by SEM, spectroscopic ellipsometry (SE), and x-ray photoelectron spectroscopy. All techniques provided coherent values, with percentages between 12% and 19%. Despite the presence of TiO2 NPs, SE measurements confirmed that the plasma-deposited SiO2 matrix was dense with an optical quality similar to the one of thermal silica. Finally, the percentage of TiO2 NPs inside the SiO2 matrix and the effective refractive index of the NCs can be tuned through judicious control of the injection sequence.