Simulation of laser-plasma focusing using taper solenoid

Abstract

Abstract A laser ion source can produce ion beams of various elements, including high melting point metals. Owing to its ability to switch beams rapidly by loading multiple solid targets, we are developing a laser ion source to implement it in a 400 kV ion implanter, which requires a wide range of ion species. Although a laser ion source offers above advantages, most of the plasma is lost in an ion source due to the generation of the beam from a part of the diffused plasma with a broad angular distribution. To suppress this loss and enhance beam intensity, we employ a linear solenoid to increase the amount of plasma reaching the extraction electrode by suppressing the three-dimensional plasma diffusion. However, the linear solenoid cannot suppress the loss of plasma near the target as the plasma spreads three-dimensionally from the plasma generation point. Therefore, by placing a taper solenoid near the target, it is possible to suppress the diffusion of plasma immediately after its generation and to transport most of the generated plasma to the extraction electrode. In this paper, we present the results of plasma trajectory calculations using the particle-in-cell method by the plasma simulations involving taper solenoids.