Effect of hydrogen addition on the deposition of titanium nitride thin films in nitrogen added argon magnetron plasma-Reference-Cited by-同舟云学术

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Effect of hydrogen addition on the deposition of titanium nitride thin films in nitrogen added argon magnetron plasma

Published:2016-05-04 Issue:22 Volume:49 Page:225203
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Saikia P,Bhuyan H,Diaz-Droguett D E,Guzman F,Mändl S,Saikia B K,Favre M,Maze J R,Wyndham E

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/49/i=22/a=225203/pdf

Reference50 articles.

1. Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films

2. Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering

3. The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films

4. Electrical and optical properties of TiN thin films

5. Deposition of TiN layer on TiNi thin films to improve surface properties

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Comparative study on the dynamics and the composition between a pulsed laser deposition (PLD) and a plasma enhanced PLD (PE-PLD);Results in Physics;2021-05

2. Study of titanium nitride film growth by plasma enhanced pulsed laser deposition at different experimental conditions;Surface and Coatings Technology;2021-01

3. Optical Emission Spectroscopy Study of Ar–H2 Plasma at Atmospheric Pressure;IEEE Transactions on Plasma Science;2018-08

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