Ion beam experiments for the study of plasma–surface interactions
Author:
Publisher
IOP Publishing
Link
http://stacks.iop.org/0022-3727/47/i=22/a=224008/pdf
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1. Principles of Plasma Discharges and Materials Processing
2. RF Sputter-Etching by Fluoro-Chloro-Hydrocarbon Gases
3. Plasma etching in integrated circuit manufacture—A review
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