Numerical study of the plasma chemistry in inductively coupled SF6and SF6/Ar plasmas used for deep silicon etching applications
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference42 articles.
1. Optical and mass spectrometric investigations of ions and neutral species inSF6radio-frequency discharges
2. Ion compositions and energies in inductively coupled plasmas containing SF6
3. Characterization of SF6/Argon Plasmas for Microelectronics Applications
4. Properties and etching rates of negative ions in inductively coupled plasmas and dc discharges produced in Ar/SF6
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