Sputter yield amplification by tungsten doping of Al2O3employing reactive serial co-sputtering: process characteristics and resulting film properties-Reference-Cited by-同舟云学术

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Sputter yield amplification by tungsten doping of Al2O3employing reactive serial co-sputtering: process characteristics and resulting film properties

Published:2011-08-10 Issue:34 Volume:44 Page:345501
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Austgen M,Koehl D,Zalden P,Kubart T,Nyberg T,Pflug A,Siemers M,Berg S,Wuttig M

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference25 articles.

1. Structure formation upon reactive direct current magnetron sputteringof transition metal oxide films

2. Magnetron sputtering – Milestones of 30 years

3. Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides

4. Increase of the deposition rate in reactive sputtering of metal oxides using a ceramic nitride target

5. Influence of the target temperature on a reactive sputtering process

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3. How microalloying of the Al target can improve process and film characteristics of sputtered alumina;Surface and Coatings Technology;2020-07

4. Tunable wavelength selectivity of photonic metamaterials-based thermal devices;Journal of Photonics for Energy;2018-12-22

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