The role of electron induced secondary electron emission from SiO2surfaces in capacitively coupled radio frequency plasmas operated at low pressures-Reference-Cited by-同舟云学术

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The role of electron induced secondary electron emission from SiO2surfaces in capacitively coupled radio frequency plasmas operated at low pressures

Published:2017-11-14 Issue:12 Volume:26 Page:124001
ISSN:1361-6595
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Horváth B,Daksha M,Korolov I,Derzsi A^ORCID,Schulze J

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Link

http://stacks.iop.org/0963-0252/26/i=12/a=124001/pdf

Reference54 articles.

1. Principles of Plasma Discharges and Materials Processing

2. Plasma Electronics

3. Physics of Radio-Frequency Plasmas

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