Interconnects for nanoscale MOSFET technology: a review
Author:
Publisher
IOP Publishing
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/1674-4926/34/i=6/a=066001/pdf
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1. Cramming More Components Onto Integrated Circuits
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3. A 0.11 μm CMOS technology featuring copper and very low k interconnects with high performance and reliability
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