Inhibition of Hyphal Growth of the Fungus Alternaria alternata by Chlorine Dioxide Gas at Very Low Concentrations

Author:

MORINO Hirofumi1,MATSUBARA Akane1,FUKUDA Toshiaki1,SHIBATA Takashi1

Affiliation:

1. Taiko Pharmaceutical Co., Ltd.

Publisher

Pharmaceutical Society of Japan

Subject

Pharmaceutical Science,Pharmacology

Reference17 articles.

1. 1) Al-Doory Y., Domson J. F., “Mould Allergy,” Lea & Febiger, Philadelphia, 1984.

2. 2) Hamada N., Yamada A., J. Antibact. Antifung. Agents, 21, 6-18 (1993).

3. 3) Takatori K., Environ. Building Services, 110, 385-389 (2005).

4. 4) Budavari S., O'Neil M. J., Smith A., Heckelman P. E., Kinneary J. F., “The Merck Index-An Encyclopedia of Chemicals, Drugs, and Biologicals,” 13th ed. Merck Research Laboratories, Whitehouse Station, NJ, 2001.

5. 5) Gates D., “The Chlorine Dioxide Handbook-Water Disinfection Series,” American Water Works Association, Denver, 1998.

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