Measurement of Particle Deposition Velocity Toward a Horizontal Semiconductor Wafer by Using a Wafer Surface Scanner-Reference-Cited by-同舟云学术

Measurement of Particle Deposition Velocity Toward a Horizontal Semiconductor Wafer by Using a Wafer Surface Scanner

Published:1994-01 Issue:1 Volume:21 Page:72-82
ISSN:0278-6826
Container-title:Aerosol Science and Technology
language:en
Short-container-title:Aerosol Science and Technology

Author:

Bae Gwi-Nam,Lee Chun Sik,Park Seung O.

Publisher

Informa UK Limited

Subject

Pollution,General Materials Science,Environmental Chemistry

Link

http://www.tandfonline.com/doi/pdf/10.1080/02786829408959697

Reference12 articles.

1. Chae , S. K. , Liu , B. Y. H. , Bae , G. N. , Myong , H. K. , and Lee , C. S. ( 1993 ). InProceedings of the 39th Annual Technical Meeting, Vol. 1, Las Vegas, NV, May 2–7. Institute of Environmental Sciences , Mount Prospect , IL , pp. 336 – 344 .

2. Turbulent deposition and gravitational sedimentation of an aerosol in a vessel of arbitrary shape

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