Intensity Distribution of Aberration-free Diffraction Patterns Due to Circular Apertures in Large F-number Optical Systems
Author:
Affiliation:
1. a Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo 185, Japan
Publisher
Informa UK Limited
Subject
Electronic, Optical and Magnetic Materials
Link
https://www.tandfonline.com/doi/pdf/10.1080/713819241
Reference6 articles.
1. Phase Distribution near Focus in an Aberration-free Diffraction Image
2. Study of Optical Diffraction Images at Microwave Frequencies*
3. CALCULATED INTENSITY AND PHASE DISTRIBUTION IN THE IMAGE SPACE OF A MICROWAVE LENS
4. MEASURED PHASE DISTRIBUTION IN THE IMAGE SPACE OF A MICROWAVE LENS
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