Coessential-connection by microwave plasma chemical vapor deposition: a common process towards wafer scale single crystal diamond-Reference-Cited by-同舟云学术

Coessential-connection by microwave plasma chemical vapor deposition: a common process towards wafer scale single crystal diamond

Published:2021-01-02 Issue:1 Volume:1 Page:47-62
ISSN:2694-1112
Container-title:Functional Diamond
language:en
Short-container-title:Functional Diamond

Author:

Shu Guoyang¹²,Dai Bing¹,Bolshakov Andrey¹²,Wang Weihua¹,Wang Yang¹,Liu Kang¹,Zhao Jiwen¹,Han Jiecai¹,Zhu Jiaqi¹³

Affiliation:

1. National Key Laboratory of Science and Technology on Advanced Composites in Special Environments, Harbin Institute of Technology, Harbin, P.R. China

2. Prokhorov General Physics Institute, Russian Academy of Sciences, Moscow, Russia

3. Ministry of Education, Key Laboratory of Micro-systems and Micro-structures Manufacturing, Harbin, P.R. China

Publisher

Informa UK Limited

Link

https://www.tandfonline.com/doi/pdf/10.1080/26941112.2020.1869511

Reference96 articles.

1. Reliability improvement of diamond drill bits using design of experiments

2. Deposition and Application of CVD Diamond Films on the Interior-Hole Surface of Silicon Carbide Compacting Dies

3. Diamond anvil cell and high-pressure physical investigations

4. Thermal conductivity of high purity synthetic single crystal diamonds

5. Phonon scattering in chemical-vapor-deposited diamond

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