Parametric investigation of flexographic printing processes for R2R printed electronics
Author:
Affiliation:
1. School of Mechanical and Aerospace Engineering, Nanyang Technological University, Singapore, Singapore
2. Large Area Processing Programme, Singapore Institute of Manufacturing Technology (Simtech), Singapore, Singapore
Publisher
Informa UK Limited
Link
https://www.tandfonline.com/doi/pdf/10.1080/10426914.2020.1732411
Reference46 articles.
1. Nanoimprint lithography: An old story in modern times? A review
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3. Imprint of sub-25 nm vias and trenches in polymers
4. Investigation of Antiadhesive Coatings for Nanoimprinting Lithography
5. Roll-to-roll large-format slot die coating of photosensitive resin for UV embossing
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