Improvement of the wiggling profile of spin-on carbon hard mask by H[sub 2] plasma treatment-Reference-Cited by-同舟云学术

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Improvement of the wiggling profile of spin-on carbon hard mask by H[sub 2] plasma treatment

Published:2008 Issue:1 Volume:26 Page:67
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Tadokoro M.,Yonekura K.,Yoshikawa K.,Ono Y.,Ishibashi T.,Hanawa T.,Fujiwara N.,Matsunobe T.,Matsuda K.

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Improvement of the Pattern Wiggling Profile by Photo Resist Treatment;ECS Transactions;2017-08-01

2. Surface Modification of Poly(methyl methacrylate) by Hydrogen-Plasma Exposure and Its Sputtering Characteristics by Ultraviolet Light Irradiation;Japanese Journal of Applied Physics;2013-09-01

3. Hydrogen Plasma Exposure of Polymethylmethacrylate and Etching by Low Energy Ar+ Ion Beam;Journal of the Vacuum Society of Japan;2013

4. Fullerene-based spin-on-carbon hardmask;Microelectronic Engineering;2012-10

5. High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask;SPIE Proceedings;2012-03-29

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