In situ collector cleaning and extreme ultraviolet reflectivity restoration by hydrogen plasma for extreme ultraviolet sources-Reference-Cited by-同舟云学术

In situ collector cleaning and extreme ultraviolet reflectivity restoration by hydrogen plasma for extreme ultraviolet sources

Published:2016-03 Issue:2 Volume:34 Page:021305
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Elg Daniel T.¹,Sporre John R.²,Panici Gianluca A.¹,Srivastava Shailendra N.³,Ruzic David N.¹

Affiliation:

1. Department of Nuclear, Plasma, and Radiological Engineering, Center for Plasma-Material Interactions, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801

2. Department of Nuclear, Plasma, and Radiological Engineering, Center for Plasma-Material Interactions, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 and IBM Corporation, Albany, New York 12203

3. Applied Research Institute, University of Illinois at Urbana-Champaign, Champaign, Illinois 61820

Funder

Directorate for Engineering (ENG)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.4942456

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