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Atomic layer deposition of molybdenum disulfide films using MoF6 and H2S

  • Published:2018-01 Issue:1 Volume:36 Page:01A125
  • ISSN:0734-2101
  • Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
  • language:en
  • Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Mane Anil U.1,Letourneau Steven2,Mandia David J.1,Liu Jian3,Libera Joseph A.1,Lei Yu1,Peng Qing1,Graugnard Elton4,Elam Jeffrey W.5

Affiliation:

1. Energy Systems Division, Argonne National Laboratory, 9700 S. Cass Ave., Argonne, Illinois 60439

2. Micron School of Materials Science and Engineering, Boise State University, 1910 University Dr., Boise, Idaho 83725

3. Department of Chemistry, Northwestern University, 2145 Sheridan Rd., Evanston, Illinois 60208

4. Micron School of Materials Science and Engineering, Boise State University, 1910 University Dr., Boise Idaho 83725

5. Energy Systems Division, Argonne National Laboratory, 9700 S. Cass Ave, Argonne, Illinois 60439

Funder

National Science Foundation

U.S. Department of Energy

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
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