Characterization of methyl-doped silicon oxide film deposited using Flowfill™ chemical vapor deposition technology-Reference-Cited by-同舟云学术

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Characterization of methyl-doped silicon oxide film deposited using Flowfill™ chemical vapor deposition technology

Published:2002 Issue:3 Volume:20 Page:828
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Lu Hongqiang,Cui Hao,Bhat Ishwara,Murarka Shyam,Lanford Williams,Hsia Wei-Jen,Li Weidan

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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3. The search for enhanced dielectric strength of polymer‐based dielectrics: A focused review on polymer nanocomposites;Journal of Applied Polymer Science;2020-05-21

4. Initial Surface Reaction of Di-Isopropylaminosilane on a Fully Hydroxyl-Terminated Si (001) Surface;Journal of Nanoscience and Nanotechnology;2014-10-01

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