Fine pattern definition with atomic intermixing induced by focused ion beam and its application to x-ray mask fabrication
-
Published:1991-03-01
Issue:
Volume:
Page:
-
ISSN:1071-1023
-
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
-
language:
-
Short-container-title:
您需要登录后可以查看相关数据！