The photoemission spectromicroscope multiple‐application x‐ray imaging undulator microscope (maximum)-Reference-Cited by-同舟云学术

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The photoemission spectromicroscope multiple‐application x‐ray imaging undulator microscope (maximum)

Published:1990-05 Issue:3 Volume:8 Page:2563-2565
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Ng W.,Ray‐Chaudhuri A. K.,Crossley S.,Crossley D.,Gong C.,Guo J.,Hansen R.,Margaritondo G.,Cerrina F.,Underwood J.,Perera R.,Kortright J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.576736

Cited by 29 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. References;X-ray Microscopy;2019-11-30

2. Appendix A X-Ray Data Tabulations;X-ray Microscopy;2019-11-30

3. Applications, and Future Prospects;X-ray Microscopy;2019-11-30

4. Radiation Damage and Cryo Microscopy;X-ray Microscopy;2019-11-30

5. Coherent Imaging;X-ray Microscopy;2019-11-30

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