Thin film formation of In2O3, TiN, and TaN by rf reactive ion plating
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Published:1975-07
Issue:4
Volume:12
Page:818-820
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ISSN:0022-5355
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Container-title:Journal of Vacuum Science and Technology
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language:en
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Short-container-title:Journal of Vacuum Science and Technology
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
60 articles.
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