Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography-Reference-Cited by-同舟云学术

Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography

Published:2017-11 Issue:6 Volume:35 Page:061603
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Fallica Roberto,Kazazis Dimitrios,Kirchner Robert¹,Voigt Anja²,Mochi Iacopo,Schift Helmut,Ekinci Yasin

Affiliation:

1. Institute of Semiconductors and Microsystems, Technische Universität Dresden, 01062 Dresden, Germany

2. micro resist technology GmbH, Köpenicker Str. 325, 12555 Berlin, Germany

Funder

EC | Directorate-General for Research and Innovation

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5003476

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