Dense Plasma Focus—High-Energy-Density Pulsed Plasma Device Based Novel Facility for Controlled Material Processing and Synthesis

Author:

Rawat Rajdeep Singh

Publisher

Springer Singapore

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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Deposition of molybdenum carbide thin films by dense plasma focus device;Radiation Effects and Defects in Solids;2022-07-27

2. Research with plasma foci in countries of Asia, Africa, and Latin America;Reviews of Modern Plasma Physics;2020-04-09

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