Author:
Yirak Mekonnen Getnet,Chaujar Rishu
Publisher
Springer Nature Singapore
Reference73 articles.
1. Rony MW, Mondol P, Myler HR. Sensitivity of a 10nm dual-gate GAA Si nanowire nMOSFETto process variation. In: 19th international conference on computer and information technology ICCIT 2016; 2017. p. 557–62.
2. He Y, Fan C, Lee ST. Silicon nanostructures for bioapplications. Nano Today [Internet]. 2010;5(4):282–95. Available from: https://doi.org/10.1016/j.nantod.2010.06.008.
3. Bayda S, Adeel M, Tuccinardi T, Cordani M, Rizzolio F. The history of nanoscience and nanotechnology: from chemical – physical applications to nanomedicine. nature nanotechnology. 2020;25(1):112. (Figure 1):1–15. https://doi.org/10.3390/molecules25010112
4. Kalra P. Advanced source/drain technologies for nanoscale CMOS. Berkeley: University of California; 2008.
5. Kale AS, Nemeth W, Harvey SP, Page M, Young DL, Agarwal S, et al. Effect of silicon oxide thickness on polysilicon based passivated contacts for high-efficiency crystalline silicon solar cells. Sol Energy Mater Sol Cells. 2018;185:270–6.