Application of ionic microanalysis to the determination of boron depth profiles in silicon and silica-Reference-Cited by-同舟云学术

Application of ionic microanalysis to the determination of boron depth profiles in silicon and silica

Published:1972-12 Issue:2 Volume:12 Page:85-94
ISSN:0134-0719
Container-title:Journal of Radioanalytical Chemistry
language:en
Short-container-title:J. Radioanal. Chem.

Author:

Blanchard B.,Hilleret N.,Quoirin J. B.

Publisher

Springer Science and Business Media LLC

Subject

Health, Toxicology and Mutagenesis,Public Health, Environmental and Occupational Health,Spectroscopy,Pollution,Radiology, Nuclear Medicine and imaging,Nuclear Energy and Engineering,Analytical Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF02520978.pdf

Reference6 articles.

1. G. Slodzian, Thesis,Ann. Phys., 9 (1964) 591.

2. J. M. Rouberol et al., 16th Ann. Conf. on Mass Spectrometry and Allied Topics, Pitts burgh, 1968.

3. G. Slodzian, Private communication.

4. G. Slodzian, J. F. Hennequin,Compt. rend. Acad. Sci., 263B (1968) 1246.

5. J. F. Hennequin Thesis, C.N.R.S. AO 2098.

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