Damage mechanisms during lapping and mechanical polishing CdZnTe wafers-Reference-Cited by-同舟云学术

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Damage mechanisms during lapping and mechanical polishing CdZnTe wafers

Published:2010-05-21 Issue:3 Volume:29 Page:276-279
ISSN:1001-0521
Container-title:Rare Metals
language:en
Short-container-title:Rare Metals

Author:

Li Yan,Kang Renke,Gao Hang,Wu Dongjiang

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Metals and Alloys,Physical and Theoretical Chemistry,Condensed Matter Physics

Link

http://link.springer.com/content/pdf/10.1007/s12598-010-0048-9.pdf

Reference12 articles.

1. Duff M.C., Hunter D.B., Burger A., Groza M., Buliga V., and Black D.R., Effect of surface preparation technique on the radiation detector performance of CdZnTe, Appl. Surf. Sci., 2008, 254(9): 2889.

2. Schlesinger T.E., Toney J.E., Yoon H., Lee E.Y., Brunett B.A., Franks L., and Hames R.B., Cadmium zinc telluride and its use as a nuclear radiation detector material, Mater. Sci. Eng. R, 2001, 32(4–5): 103.

3. Badano G., Garland J.W., and Sivananthan S., Accuracy of the in situ determination of the CdZnTe temperature by ellipsometry before the growth of HgCdTe by MBE, J. Cryst. Growth, 2003, 251(1): 571.

4. Zha G.Q., Jie W.Q., Li Q., Zeng D.M., Yang G., Bai X.X., Wang T., Zhang W.H., and Xu F.Q., The study on the surface state of CdZnTe (110) surface, Appl. Surf. Sci., 2006, 252(24): 8421.

5. Zha G.Q., Jie W.Q., Tan T.T., Li P.S., Zhang W.H., and Xu F.Q., The atomic and electronic structure of CdZnTe (111) A surface, Chem. Phys. Lett., 2006, 427(1–3): 197.

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2. Machining Stability Research of Soft-Brittle Crystals Lapping by Fixed-Abrasive Pad;Integrated Ferroelectrics;2022-07-28

3. Impact of polishing on crystallinity and static performance of Cd1−xZnxTe;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2020-12

4. Compliant grinding and polishing: A review;International Journal of Machine Tools and Manufacture;2020-11

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