Condensation distribution and evolution characteristics of water vapor in annulus of flexible riser

Abstract

AbstractWater vapor penetrating an annulus causes condensation and corrosion and endangers the safe operation of the flexible riser. However, in current studies, the condensation of water vapor in the annulus is modeled based on the film condensation hypothesis, which assumes that the metal material is uniformly corroded. This assumption differs from the true corrosion incidents, which are usually initiated by localized corrosion. To further study the condensation law of water vapor in a flexible riser annulus, the evolution of water vapor condensation on the wall surface of a sapphire reactor was evaluated using an annular condensation experimental device. A water vapor condensation growth model was established to analyze the condensation law and its influencing factors. The results show that the maximum radius of condensate droplets on the annular wall surface is approximately 0.48 cm, the average radius of droplets is approximately 0.35 cm, and the volume of condensate that can be accommodated in the 18 × 18 mm simulation area is approximately 0.5 cm3. After the droplet reaches the departure radius and falls off a surface, the time of recondensation is faster than that of the first condensation. The condensation surface coverage increases rapidly in the early stage and then gradually slows down. After stabilization, the maximum coverage can reach 80%. Parameter analysis suggests that the number of fixed nucleation points on the condensation wall affects the time to reach the departure radius and the increasing rate of surface coverage. However, the number of fixed nucleation points has minimal influence on the departure radius and coverage outcomes. The findings of this study establish a theoretical foundation for predicting dropwise condensation behaviors in annulus of pipelines and developing corrosion protection strategies that modify the wall contact angle or structure.