High-k titanium–aluminum oxide dielectric films prepared by inorganic–organic hybrid solution
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Publisher
Springer Science and Business Media LLC
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http://link.springer.com/content/pdf/10.1007/s10971-014-3400-y.pdf
Reference30 articles.
1. Shi L, Xia YD, Xu B, Yin J, Liu ZG (2007) Thermal stability and electrical properties of titanium–aluminum oxide ultrathin films as high-k gate dielectric materials. J Appl Phys 101:034102
2. Meyers ST, Anderson JT, Hong D, Hung CM, Wager JF, Keszler DA (2007) Solution-processed aluminum oxide phosphate thin-film dielectrics. Chem Mater 19:4023–4029
3. Song K, Yang W, Jung Y, Jeong S, Moon J (2012) A solution-processed yttrium oxide gate insulator for high-performance all-solution-processed fully transparent thin film transistors. J Mater Chem 22:21265–21271
4. Choi S, Park BY, Jang M, Jeong S, Lee JY, Ryu BH, Seong TY, Jung HK (2011) Solution processed high-k lanthanide oxides for low voltage driven transparent oxide semiconductor thin film transistors. ECS Trans 35(4):901–908
5. Li XF, Xin EL, Zhang JH (2013) Low-temperature solution-processed zirconium oxide gate insulators for thin-film transistors. IEEE T Electron Dev 60(10):3413–3416
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