In-situ process monitoring for eco-friendly chemical vapor deposition chamber cleaning
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Physics and Astronomy
Link
https://link.springer.com/content/pdf/10.1007/s40042-021-00307-8.pdf
Reference25 articles.
1. C.C. Lai, Y.H. Chang, H.J. Chien, M.C. Lu, Hard mask and lithographic capabilities improvement by amorphous carbon step coverage optimization in high aspect ratio device pattern. Vacuum 153, 267 (2018). https://doi.org/10.1016/j.vacuum.2018.04.005
2. S.J. Park, D. Kim, S. Lee, Y. Ha, M. Lim, K. Kim, Diamond-like amorphous carbon layer film by an inductively coupled plasma system for next generation etching hard mask. Thin Solid Films 663, 21 (2018). https://doi.org/10.1016/j.tsf.2018.08.007
3. S. Kwon, Y. Park, W. Ban, C. Youn, S. Lee, J. Yang, D. Jung, T. Choi, Effect of plasma power on properties of hydrogenated amorphous silicon carbide hardmask films deposited by PECVD. Vacuum 174, 109187 (2020). https://doi.org/10.1016/j.vacuum.2020.109187
4. G. Lee, D.K. Sohn, S.H. Seok, H.S. Ko, The effect of hole density variation in the PECVD reactor showerhead on the deposition of amorphous carbon layer. Vacuum 163, 37 (2019). https://doi.org/10.1016/j.vacuum.2019.02.009
5. D. Kim, T. Kim, S.H. Park, S.K. Lim, H. Lee, T. Kim, S. Kang, Characterization of particle generated during plasma-enhanced chemical vapor deposition on amorphous carbon layer using particle beam mass spectrometer. J. Vac. Sci. Technol. A 36, 21506 (2018). https://doi.org/10.1116/1.5000087
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