Hydrogen on Semiconductor Surfaces-Reference-Cited by-同舟云学术

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Hydrogen on Semiconductor Surfaces

Published:1986 Issue: Volume: Page:61-79
ISSN:0258-1221
Container-title:Hydrogen in Disordered and Amorphous Solids
language:
Short-container-title:

Author:

Corbett James W.,Peak D.,Pearton S. J.,Sganga A. G.

Publisher

Springer US

Link

http://link.springer.com/content/pdf/10.1007/978-1-4899-2025-6_7

Reference157 articles.

1. A. Van Wieringen and N. Warmoltz, Physica 22:849 (1956).

2. S.T. Picraux and F.L. Vook, Phys. Rev. B14:1593 (1976).

3. S.T. Picraux and F.L. Vook, Phys. Rev. B18:2066 (1978).

4. S.T. Picraux, F.L. Vook, and H.J. Stein in: “Defects and Radiation Effects in Semiconductors, 1978,” ed. J.H. Albany (Inst. Phys. Bristol, 1979) p. 31.

5. J.A. Appelbaum, D.R. Hamann, and K.H. Tasso, Phys. Rev. Lett. 38:1478 (1977).

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1. New Materials: Semiconductors for Solar Cells;Materials Science and Technology;2013-02-15

2. Silicon device processing in H-ambients: H-diffusion mechanisms and influence on electronic properties;Journal of Electronic Materials;2001-12

3. Hydrogen-assisted processing of materials;Materials Science and Engineering: A;2000-09

4. Transport of hydrogen in films of graphite, amorphous silicon, and nickel oxide;Semiconductors;1997-02

5. Diffusion of Hydrogen in Semiconductors;Hydrogen in Crystalline Semiconductors;1992

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