1. K.N. Chen, C.S. Tan, A. Fan, and R. Reif, Appl. Phys. Lett. 86, 011903 (2005).
2. S. Pozder, A. Jain, R. Chatterjee, Z. Huang, R.C. Jones, E. Acosta, B. Marlin, G. Hillmann, M. Sobczak, G. Kreindl, S. Kanagavel, H. Kostner, and S. Pargfrieder, International Interconnect Technology Conference, 2008 (2008), p. 46.
3. J.-Q. Lu, Y. Kwon, R.P. Kraft, R.J. Gutman, J.F. McDonald, and T.S. Cale, Proceedings of the IEEE International Interconnect Technology Conference (2001), p. 219.
4. J.C. Koob, D.A. Leder, R.J. Sung, T.L. Brandon, D.G. Elliott, B.F. Cockburn, and L. McIlrath, IEEE Trans. VLSI Syst. 13, 358 (2005).
5. H. Tilmans, D. Van de Peer, and E. Beyne, J. Microelectromech. Syst. 9, 206 (2000).