Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching

Author:

Lee C.-H.,Chang T.-W.,Lee K.-L.,Lin J.-Y.,Wang J.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Cited by 24 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Click chemistry assisted organic-inorganic hybrid photoresist for ultra-fast two-photon lithography;Additive Manufacturing;2022-03

2. Multi-photon laser lithography of AR-N 4340 photoresist with a spatial resolution at nanoscale;9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology;2019-02-06

3. One-Photon Absorption-Based Direct Laser Writing of Three- Dimensional Photonic Crystals;Theoretical Foundations and Application of Photonic Crystals;2018-04-04

4. Two-photon polymerization of hydrogels – versatile solutions to fabricate well-defined 3D structures;RSC Adv.;2014-09-02

5. High aspect ratio submicrometer two-dimensional structures fabricated by one-photon absorption direct laser writing;Microsystem Technologies;2014-02-06

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